TITLE:

Advancements in Predictive Laser-Produced-Plasma Formation Modeling

DATE:

Friday, September 11th, 2015

TIME:

3:30 PM

LOCATION:

GMCS 214

SPEAKER:

Dr. Alexander Schafgans. Cymer, Inc.

ABSTRACT:

Cymer is the world’s leading supplier of light sources for advanced lithography equipment used to

produce advanced semiconductor devices. Next generation semiconductor manufacturing processes

require lithography sources that produce light at wavelengths in the EUV range (13.5nm). Cymer is

developing and manufacturing EUV sources that produce EUV light from a laser-produced plasma.

Here, we present highlights from plasma simulations performed in collaboration with Lawrence Livermore

National Laboratory, a highly regarded government research facility with extensive plasma expertise

developed in support of U.S. Dept. of Energy programs. This partnership is designed to advance the rate

of learning about optimal EUV generation with laser produced plasmas for use in the semiconductor

photolithography industry and to provide insights where experimental results are not currently available.

We will discuss simulations performed using a 3D radiation-hydrodynamics code to study the plasma

produced by a laser pulse incident on a tin droplet and thin disk, as well as free-space deformation of a tin

droplet into a thin disk due to a laser pulse using advanced algorithms like adaptive mesh refinement

ALE-AMR.

HOST:

Dr. Ricardo Carretero

DOWNLOAD: